Citation: | S. Chen, F. Song, Y. Dong, N. Cui, Y. Liu, and X. Chen, “Precision synchronous control of multiple motion systems: A tube-based MPC approach,” IEEE/CAA J. Autom. Sinica, vol. 12, no. 5, pp. 1–15, May 2025. |
[1] |
M. F. Heertjes, H. Butler, N. J. Dirkx, S. H. van der Meulen, R. Ahlawat, K. O’Brien, J. Simonelli, K.-T. Teng, and Y. Zhao, “Control of wafer scanners: Methods and developments,” in Proc. IEEE American Control Conf. , 2020, pp. 3686–3703.
|
[2] |
L. Li, S. Hu, L. Zhao, P. Ma, J. Li, and L. Zhong, “A new synchronization control method of wafer and reticle stage in step and scan lithographic equipment,” Optik, vol. 124, no. 24, pp. 6861–6865, 2013. doi: 10.1016/j.ijleo.2013.07.003
|
[3] |
Y. M. Al-Rawashdeh, M. Al-Tamimi, M. Heertjes, and M. Al Janaideh, “Micro-positioning end-stage for precise multi-axis motion control in optical lithography machines: preliminary results,” in Proc. IEEE American Control Conf., 2021, pp. 40–47.
|
[4] |
F. Song, Y. Liu, Y. Dong, X. Chen, and J. Tan, “Motion control of wafer scanners in lithography systems: From setpoint generation to multi-stage coordination,” IEEE Trans. Instrumentation and Measurement, 2024.
|
[5] |
E. Evers, M. van de Wal, and T. Oomen, “Beyond decentralized wafer/reticle stage control design: A double-youla approach for enhancing synchronized motion,” Control Engineering Practice, vol. 83, pp. 21–32, 2019. doi: 10.1016/j.conengprac.2018.10.011
|
[6] |
M. Li, T. Chen, R. Cheng, K. Yang, Y. Zhu, and C. Mao, “Dual-loop iterative learning control with application to an ultraprecision wafer stage,” IEEE Trans. Industrial Electronics, vol. 69, no. 11, pp. 11590–11599, 2021.
|
[7] |
F. Song, Y. Liu, D. Shen, L. Li, and J. Tan, “Learning control for motion coordination in wafer scanners: toward gain adaptation,” IEEE Trans. Industrial Electronics, vol. 69, no. 12, pp. 13 428–13 438, 2022. doi: 10.1109/TIE.2022.3142428
|
[8] |
J. Xiaoming, Y. Zhiliang, and C. Xinglin, “Iterative learning control for the synchronization control system of the scanner,” in Proc. IEEE 11th World Congress on Intelligent Control and Automation, 2014, pp. 2519–2524.
|
[9] |
W. Liu, R. Ding, X. Yang, C. Ding, and F. Shu, “A parallel inversemodel-based iterative learning control method for a master-slave wafer scanner,” in Proc. 46th Annual Conf. IEEE Industrial Electronics Society, 2020, pp. 41–46.
|
[10] |
M. Heertjes and B. Temizer, “Data-based control tuning in master-slave systems,” in Proc. IEEE American Control Conference, 2012, pp. 2461–2466.
|
[11] |
M. F. Heertjes, B. Temizer, and M. Schneiders, “Self-tuning in master–Slave synchronization of high-precision stage systems,” Control Engineering Practice, vol. 21, no. 12, pp. 1706–1715, 2013. doi: 10.1016/j.conengprac.2013.08.007
|
[12] |
Z. Wu and X. Chen, “Synchronization control for reticle stage and wafer stage based on iterative learning control,” Inform. Technology J., vol. 11, no. 4, p. 492, 2012. doi: 10.3923/itj.2012.492.495
|
[13] |
B. Wang, P. Shi, H. R. Karimi, and J. Wang, “H∞ robust controller design for the synchronization of master-slave chaotic systems with disturbance input,” 2012.
|
[14] |
M. Nakamura, D. Hiyamizu, and N. Kyura, “A method for precise contour control of mechatronic servo system with master-slave axes by use of synchronous position control,” Trans. Society of Instrument and Control Engineers, vol. 33, no. 4, pp. 274–279, 1997. doi: 10.9746/sicetr1965.33.274
|
[15] |
P. Shi, W. Sun, X. Yang, I. J. Rudas, and H. Gao, “Master-slave synchronous control of dual-drive gantry stage with cogging force compensation,” IEEE Trans. Systems, Man, and Cybern.: Systems, vol. 53, no. 1, pp. 216–225, 2022.
|
[16] |
C. J. Lambregts, M. F. Heertjes, and B. J. van der Veek, “Multivariable feedback control in stage synchronization,” in Proc. IEEE American Control Conference, 2015, pp. 4149–4154.
|
[17] |
V. A. Looijen and M. F. Heertjes, “Robust synchronization of motion in wafer scanners using particle swarm optimization,” in Proc. IEEE Conf. Control Technology and Applications, 2018, pp. 1102–1107.
|
[18] |
Z. Kuang, H. Gao, and M. Tomizuka, “Precise linear-motor synchronization control via cross-coupled second-order discrete-time fractionalorder sliding mode,” IEEE/ASME Trans. Mechatronics, vol. 26, no. 1, pp. 358–368, 2020.
|
[19] |
Z. Liu, W. Lin, X. Yu, J. J. Rodr′ıguez-Andina, and H. Gao, “Approximation-free robust synchronization control for dual-linearmotors-driven systems with uncertainties and disturbances,” IEEE Trans. Industrial Electronics, vol. 69, no. 10, p. 10, 2021.
|
[20] |
X. Ping, S. Yang, P. Wang, and Z. Li, “An observer-based output feedback robust mpc approach for constrained lpv systems with bounded disturbance and noise,” Int. J. Robust and Nonlinear Control, vol. 30, no. 4, pp. 1512–1533, 2020. doi: 10.1002/rnc.4836
|
[21] |
S.-D. Huang, K.-Y. Peng, G.-Z. Cao, C. Wu, J. Xu, and J. He, “Robust precision position tracking of planar motors using min-max model predictive control,” IEEE Trans. Industrial Electronics, vol. 69, no. 12, p. 13, 2021.
|
[22] |
M. Schwenzer, M. Ay, T. Bergs, and D. Abel, “Review on model predictive control: An engineering perspective,” The International J. Advanced Manufacturing Technology, vol. 117, no. 5−6, pp. 1327–1349, 2021.
|
[23] |
Y.-W. Wang, T. Yan, W.-A. Zhang, M. Wu, and C. Lu, “Learningenabled output-feedback-MPC-based synchronization tracking control of multiaxis motion systems,” IEEE Trans. Industrial Electronics, vol. 70, no. 7, pp. 7216–7224, 2022.
|
[24] |
A. Alavilli, K. Nguyen, S. Schoedel, B. Plancher, and Z. Manchester, “TinyMPC: Model-predictive control on resource-constrained microcontrollers,” arXiv preprint arXiv: 2310.16985, 2023.
|
[25] |
B. Ding and H. Pan, “Output feedback robust mpc with one free control move for the linear polytopic uncertain system with bounded disturbance,” Automatica, vol. 50, no. 11, pp. 2929–2935, 2014. doi: 10.1016/j.automatica.2014.10.021
|
[26] |
X. Ping, J. Yao, B. Ding, and Z. Li, “Tube-based output feedback robust mpc for LPV systems with scaled terminal constraint sets,” IEEE Trans. Cybern., vol. 52, no. 8, pp. 7563–7576, 2021.
|
[27] |
Y. M. Al-Rawashdeh, M. Al Janaideh, and M. Heertjes, “On synchronization of generic lithography machine open-chains using a novel fine-positioning stage system,” in Proc. IEEE Conf. Control Technology and Applications, 2021, pp. 1089–1094.
|
[28] |
R.-H. M. Schmidt, “Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry,” Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, vol. 370, no. 1973, pp. 3950–3972, 2012. doi: 10.1098/rsta.2011.0054
|
[29] |
R. Voorhoeve, R. de Rozario, W. Aangenent, and T. Oomen, “Identifying position-dependent mechanical systems: A modal approach applied to a flexible wafer stage,” IEEE Trans. Control Systems Technology, vol. 29, no. 1, pp. 194–206, 2020.
|
[30] |
T. Huang, K. Yang, Y. Zhu, Q. Tang, F. Liu, and Y. Wang, “Pole assignment control of mimo motion systems with flexible structures and its application to an ultraprecision wafer stage,” IEEE/ASME Trans. Mechatronics, vol. 23, no. 5, pp. 2273–2284, 2018. doi: 10.1109/TMECH.2018.2866238
|
[31] |
D. Q. Mayne, J. B. Rawlings, C. V. Rao, and P. O. Scokaert, “Constrained model predictive control: Stability and optimality,” Automatica, vol. 36, no. 6, pp. 789–814, 2000. doi: 10.1016/S0005-1098(99)00214-9
|
[32] |
P. Gahinet, A. Nemirovski, A. J. Laub, and M. Chilali, LMI Control Toolbox For Use With MATLAB, User’s Guide, 1995.
|
[33] |
S. Chen, Y. Liu, F. Song, and N. Cui, “Model prediction based feedforward control for precision motion stage,” in Proc. IEEE 42nd Chinese Control Conf., 2023, pp. 2826–2831.
|
[34] |
K. Sakata and H. Fujimoto, “Master-slave synchronous position control for precision stages based on multirate control and dead-time compensation,” in Proc. IEEE/ASME Int. Conf. Advanced Intelligent Mechatronics, 2009, pp. 263–268.
|
[35] |
H. Butler, “Position control in lithographic equipment[applications of control],” IEEE Control Systems Magazine, vol. 31, no. 5, pp. 28–47, 2011. doi: 10.1109/MCS.2011.941882
|
[36] |
P. Lambrechts, M. Boerlage, and M. Steinbuch, “Trajectory planning and feedforward design for electromechanical motion systems,” Control Engineering Practice, vol. 13, no. 2, pp. 145–157, 2005. doi: 10.1016/j.conengprac.2004.02.010
|